Alternative (to mainstream Silicon CMOS technologies) semiconductor manufacturing process technologies able to sustain in the mid and

long-terms the fast pace evolution of device performance, miniaturisation and cost, while reducing environmental footprint. RESIN

GREEN proposes the development of new resist material platforms that can be processed under conditions offering clear advantages

regarding reduction of environmental footprint. In particular, new resist chemistries targeting to materials than can be processed

(deposited and developed) by using environmentally friendly solvents such as water, very dilute aqueous base solutions, or green organic

solvents. In this context we will develop new resist materials in order to eliminate the use of organic solvents and aqueous alkaline

solutions that are currently used in the lithographic process at semiconductor manufacturing industry. The lithographical process steps

that demand the major amounts of solvents are the spin coating solution of the photoresist as well as the development process. We target

to replace the standard organic solvents which are used in spin coating and the highly alkaline TMAH solutions used in development

with water. The use of greener organic solvents and very dilute basic developers will only be considered if necessary for meeting high

performance requirements. Our target is to investigate bio-source materials and new photoresist platforms suitable for exposure at 193

nm, 248 nm or EUV and achieve significant breakthroughs by designing a complete process, using renewable resources and neither

organic solvent nor hazardous chemicals. In addition, e-beam lithography will be considered, especially for evaluating the high resolution

potential of the proposed resist materials.